Deposition

Deposition

ALD System Tier 3, Room 124 Capabilities: Typically allows 4-inch substrates. Possible deposition materials include Titanium Oxide, Silicon Dioxide, Aluminum Oxide, Zinc Oxide, Platinum and Ruthenium. Manufacturer/ Product Name: Anric Technologies, AT 410

6-Gun Sputtering System Tier 3, Room 124 Capabilities: Typically allows 4-inch substrates, and 6 2-inch targets. This system is equipped with 6 DC power supplies and 1 RF power supply. Toxic materials are not allowed in this system. Manufacturer/ Product Name: AJA International, ATC 2200-V

2-Gun EBeam Evaporation Tier 3, Room 124 Capabilities: Typically allows 4-inch substrates. There are 2 5-pocket linear electron beam guns, with a pocket size of 7 cc (cubic centimeters). Toxic materials are not allowed in this system. Manufacturer/ Product Name: AJA International

3-Gun Sputtering System Tier 3, Room 124 Capabilities: Typically allows 4-inch substrates, and 3 3-inch targets. This system is equipped with a DC power supply and 2 RF power supplies. Toxic materials are not allowed in this system. Manufacturer/ Product Name: AJA International, ATC 1800

4-Gun Sputtering System Tier 3, Room 163 Capabilities: Typically allows 4-inch substrates, and 4 2-inch targets. This system has a DC power supply with high power impulse magnetron sputtering capabilities along with 2 RF power supplies. Toxic materials are not allowed in this system. Manufacturer/ Product Name: AJA International