Etching
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Tabletop RIETier 1, Room 124 Capabilities: Typically allows 4-inch substrates, with Sulfur Hexafluoride (SF6), Dioxygen (O2), and Dinitrogen (N2) available. Manufacturer/ Product Name: March Instruments Inc., Jupiter II |
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RIETier 2, Room ENG1 – 163 Capabilities: This is a semi-automatic reactive ion etching (RIE) system designed for etching of dielectric, passivation, and semiconductor materials. It supports a wide range of etchable materials, including silicon dioxide, silicon nitride, silicon oxy-nitride, silicon, poly-Si, polyimide, photoresist, and various polymeric films. The system accommodates samples up to 6 inches in diameter. The substrate is water-cooled, and RF power operates at 13.56 MHz with a maximum output of 200W. Available process gases include CF4, O2, Ar, and SF6, making the RIE-1C versatile for various etching applications. Manufacturer/ Product Name: SAMCO – Model: RIE-1C |